Work

High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Year: 2013

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/j.surfcoat.2013.06.011

Authors: M. Pons, R. Boichot, N. Coudurier, A. Claudel, E. Blanquet, S. Lay, F. Mercier, D. Pique

Institutions: Institut polytechnique de Grenoble, Centre National de la Recherche Scientifique, Université Joseph Fourier, Science et Ingénierie des Matériaux et Procédés, Acerde (France)

Language: English

Topic: GaN-based semiconductor devices and materials

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: Agence Nationale de la Recherche, Acerde

OpenAlex ID: W2053983622

FWCI: 1.534

Cites: 46

Cited by: 30

Related to: 10