High performance organic field-effect transistors using high-Κ dielectrics grown by atomic layer deposition (ALD)
Year: 2007
Type: conference-paper
DOI: 10.1117/12.735238
Authors: Xiao-Hong Zhang, Benoit Domercq, Xudong Wang, Seunghyup Yoo, Takeshi Kondo, Zhong Lin Wang, Bernard Kippelen
Institution: Georgia Institute of Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2054087902
