Work

Image collapse issues in photoresist

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.436855

Authors: John P. Simons, Dario L. Goldfarb, Marie Angelopoulos, Scott Messick, Wayne M. Moreau, Chris Robinson, Juan J. de Pablo, Paul F. Nealey

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center, University of Wisconsin–Madison

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2054130612

FWCI: 4.634

Cites:

Cited by: 22

Related to: 10