Work

Imprint lithography with sub-10 nm feature size and high throughput

Year: 1997

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(96)00097-4

Authors: Stephen Y. Chou, Peter R. Krauss

Institution: University of Minnesota

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2054460607

FWCI: 3.96

Cites: 9

Cited by: 377

Related to: 9