Work

Mask 3D effects and compensation for high NA EUV lithography

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2011643

Authors: Sudharshanan Raghunathan, Greg McIntyre, Germain Fenger, Obert Wood

Institutions: GlobalFoundries (United States), IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2055095265

FWCI: 3.258

Cites:

Cited by: 27

Related to: 10