Image scanning ellipsometry for measuring nonuniform film thickness profiles
Year: 1994
Type: article
Source: Applied Optics
DOI: 10.1364/ao.33.001223
Authors: An-Hong Liu, Peter C. Wayner, Joel L. Plawsky
Institution: Rensselaer Polytechnic Institute
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2055237590