Work

First performance results of the ASML alpha demo tool

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.657348

Authors: Hans Meiling, Henk Meijer, Vadim Banine, Roel Moors, Rogier Groeneveld, Harm-Jan Voorma, Uwe Mickan, Bas Wolschrijn, Bas Mertens, Gregor van Baars, Peter Kürz, Noreen Harned

Institutions: ASML (Netherlands), Netherlands Organisation for Applied Scientific Research, Philips (Netherlands), Carl Zeiss (Germany), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bundesministerium für Bildung und Forschung

OpenAlex ID: W2056685113

FWCI: 22.72

Cites: 7

Cited by: 79

Related to: 10