Work

“Force-Feedback” Leveling of Massively Parallel Arrays in Polymer Pen Lithography

Year: 2010

Type: article

Abstract: Polymer pen lithography is a recently developed molecular printing technique which can produce features with diameters ranging from 80 nm to >10 microm in a single writing step using massively parallel (>10(7) pens) arrays of pyramidal, elastomeric pens. Leveling these pen arrays with respect to the surface to produce uniform features over large areas remains a considerable challenge. Here, we describe a new method for leveling the pen arrays that utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004 degrees, thereby producing features that vary by only 50 nm over 1 cm.

Source: Nano Letters

DOI: 10.1021/nl904200t

Authors: Xing Liao, Adam B. Braunschweig, Chad. A. Mirkin

Institutions: Northwestern University, International Institute for Nanotechnology

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: National Cancer Institute, Air Force Office of Scientific Research

Awards: G3502827644, G6016945286