Work

Designing Photoresist Systems for Microlithography in Carbon Dioxide

Year: 2001

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-705-y7.8

Authors: Devin Flowers, Erik Hoggan, Joseph M. DeSimone, Ruben Carbonell

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

Funders: National Science Foundation, Georgia Institute of Technology

OpenAlex ID: W2058341899

FWCI:

Cites: 6

Cited by: 3

Related to: 10