Work

A systematic approach for integrated trend analysis—The case of etching

Year: 2010

Type: article

Source: Technological Forecasting and Social Change

DOI: 10.1016/j.techfore.2010.08.006

Authors: Feng-Shang Wu, Chun-Chi Hsu, Pei-Chun Lee, Hsin-Ning Su

Institutions: National Chengchi University, University of Sussex, National Institutes of Applied Research

Language: English

Topic: Intellectual Property and Patents

Subfield: Management of Technology and Innovation

Field: Business, Management and Accounting

Domain: Social Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2058729910

FWCI: 3.341

Cites: 32

Cited by: 30

Related to: 10