Next-generation 193-nm laser for sub-100-nm lithography
Year: 2001
Type: conference-paper
DOI: 10.1117/12.435654
Authors: Thomas P. Duffey, Gerry M. Blumenstock, Vladimir B. Fleurov, Xiaojiang Pan, Peter C. Newman, Holger Glatzel, Tom A. Watson, J. Erxmeyer, Ralf Kuschnereit, Bernhard Weigl
Institution: Carl Zeiss (Germany)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2059092273