Work

Resist double patterning on BARCs and spin-on multilayer materials

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.840419

Authors: Douglas J. Guerrero, Daniel M. Sullivan, Ramil-Marcelo L. Mercado

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bhabha Atomic Research Centre

OpenAlex ID: W2059579981

FWCI: 0.479

Cites: 7

Cited by: 1

Related to: 10