Work

Reactive‐ion etch resistant polysulfones for microlithography

Year: 1992

Type: article

Source: Makromolekulare Chemie Macromolecular Symposia

DOI: 10.1002/masy.19920530113

Authors: Murrae J. Bowden, Antoni S. Gozdz, Joseph M. DeSimone, James E. McGrath, Seiki Ito, Minoru Matsuda

Institutions: Virginia Tech, JNC (Japan), Tohoku University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2059969025

FWCI:

Cites: 12

Cited by: 6

Related to: 10