Electron heating in silicon dioxide and off-stoichiometric silicon dioxide films
Year: 1985
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.334518
Authors: D. J. DiMaria, T. N. Theis, J. R. Kirtley, F. L. Pesavento, D. W. Dong, S. D. Brorson
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2060637982