Work

A numerical method for the efficient atomistic simulation of the plasma-etch of nano-patterned structures

Year: 2011

Type: article

Source: Computational Materials Science

DOI: 10.1016/j.commatsci.2011.10.027

Authors: L. Chiaramonte, R. Colombo, G. Fazio, G. Garozzo, A. La Magna

Institutions: Institute for Microelectronics and Microsystems, Micron (Italy)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2060650165

FWCI: 0.635

Cites: 22

Cited by: 11

Related to: 10