Work

Etchant Solutions for the Removal of Cu(0) in a Supercritical CO2-Based “Dry” Chemical Mechanical Planarization Process for Device Fabrication

Year: 2003

Type: article

Source: Journal of the American Chemical Society

DOI: 10.1021/ja034091m

Authors: Carol A. Bessel, Ginger M. Denison, Joseph M. DeSimone, James DeYoung, Stephen Gross, Cynthia K. Schauer, Pamela M. Visintin

Institutions: University of North Carolina at Chapel Hill, North Carolina State University, Villanova University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2061128152

FWCI: 6.855

Cites: 5

Cited by: 51

Related to: 10