Work

Imprint of sub-25 nm vias and trenches in polymers

Year: 1995

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.114851

Authors: Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom

Institution: University of Minnesota

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2062074587

FWCI: 12.1

Cites:

Cited by: 2,763

Related to: 10