Work

Mapping of electrically active defects in silicon by optical-beam-induced reflectance

Year: 1989

Type: article

Source: Materials Science and Engineering B

DOI: 10.1016/0921-5107(89)90289-4

Authors: Gary E. Carver, John D. Michalski, Bahiru Kassahun, Greg Astfalk

Institution: AT&T (United States)

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2062730282

FWCI:

Cites: 15

Cited by: 4

Related to: 10