Work

Substrate Preparation for Nanowire Fabrication by Selective Metalization of Patterned Silane Monolayers

Year: 2006

Type: conference-paper

Abstract: In this Proceedings we show surface passivation for chemically templated growth on patterned surfaces. Our ultimate goal is to chemically pattern insulating substrates at nanometer dimensions and to grow metal lines by electroless deposition in the patterned regions. We investigate a series of monofunctional silanes of the general formula ClSi(CH3)2(CH2)n- 1CH3 as possible passivating agents for preventing adsorption of an aminosilane, Pd nanoparticles, and Cu metal by electroless deposition. The thin film made from the n = 12 silane shows excellent resistance to an aminosilane. Good resistance is also demonstrated by silane films with larger n to Pd nanoparticle deposition. Finally, it is shown that overall resistance to Cu deposition improves as n increases. Sufficient selectivity is present in these films to allow features of nanometer dimensions to be created on chemically templated surfaces. Capping the surface with ClSi(CH3)3 further improves surface passivation.

Source: ECS Transactions

DOI: 10.1149/1.2214581