Work

Mask fabrication towards sub-10 nm imprint lithography

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.600207

Authors: Jian Gu, Chun-Ping Jen, Qihuo Wei, Chiafu Chou, Frederic Zenhausern

Institution: Arizona State University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Council

OpenAlex ID: W2065267811

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