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Nanoscale Photolithography with Visible Light

Year: 2010

Type: article

Source: The Journal of Physical Chemistry Letters

DOI: 10.1021/jz1002082

Author: John T. Fourkas

Institution: University of Maryland, College Park

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2065282191

FWCI: 7.06

Cites: 26

Cited by: 63

Related to: 10