Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation
Year: 2011
Type: article
Source: Nature Materials
DOI: 10.1038/nmat3047
Authors: Yi Wei Chen, Jonathan D. Prange, Simon Dühnen, Yohan Park, Marika Gunji, Christopher E. D. Chidsey, Paul C. McIntyre
Institution: Stanford University
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2065751695