Work

Compensation of extreme ultraviolet lithography image field edge effects through optical proximity correction

Year: 2014

Type: dissertation

Source: RIT Scholar Works (Rochester Institute of Technology)

Author: Chris Maloney

Institution: Rochester Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W206627094

Cites: 41

Cited by:

Related to: 10