Work

Conformal contact and pattern stability of stamps used for soft lithography

Year: 2000

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.1289816

Authors: Alexander Bietsch, Bruno Michel

Institution: IBM Research - Zurich

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2067020292

FWCI: 8.812

Cites: 20

Cited by: 272

Related to: 10