Work

Andreev reflection in the fractional quantum Hall effect

Year: 1998
Type: article
Abstract: We study the reflection of electrons and quasiparticles on point-contact interfaces between fractional quantum Hall (FQH) states and normal metals (leads), as well as interfaces between two FQH states with mismatched filling fractions. We classify the processes taking place at the interface in the strong-coupling limit. In this regime a set of quasiparticles can decay into quasiholes on the FQH side and charge excitations on the other side of the junction. This process is analogous to an Andreev reflection in normal-metal/superconductor $(N\ensuremath{-}S)$ interfaces.
Language: English
Open Access status: green
OpenAlex ID: W2069131817
FWCI: 1.25
Cites: 23
Cited by: 48
Related to: 10