Work

Chemical deposition method for metal chalcogenide thin films

Year: 2000

Type: article

Source: Materials Chemistry and Physics

DOI: 10.1016/s0254-0584(00)00217-0

Authors: R.S. Mane, C.D. Lokhande

Institution: Shivaji University

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Syracuse University

OpenAlex ID: W2069235733

FWCI: 14.58

Cites: 185

Cited by: 826

Related to: 10