Work

New aqueous base-developable negative-tone photoresist based on furans

Year: 1991

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.46359

Authors: James T. Fahey, Jean M. J. Frechet

Institution: Cornell University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, International Business Machines Corporation

OpenAlex ID: W2069678656

FWCI:

Cites:

Cited by: 1

Related to: 10