Work

Mask pattern recording of reflection type photopolymer using total internal reflection

Year: 2007

Type: conference-paper

Source: Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR)

DOI: 10.1109/cleopr.2007.4391403

Authors: Hyeon-Seop Jeong, Nam Kim, Mi-Ran Park, Chang-Won Shin

Institution: Chungbuk National University

Language: English

Topic: Photorefractive and Nonlinear Optics

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070083762

FWCI:

Cites: 2

Cited by:

Related to: 10