Work

Profile Estimation of High-Concentration Arsenic Diffusions in Silicon

Year: 1972

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.1661253

Author: R. B. Fair

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070234777

FWCI: 1.894

Cites: 5

Cited by: 22

Related to: 10