Work

Stress-Assisted Diffusion of Boron and Arsenic in Silicon

Year: 1984

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-36-71

Authors: Michael L. Manda, M. L. Shepard, R. B. Fair, H. Z. Massoud

Institution: Duke University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070669722

FWCI:

Cites: 19

Cited by: 6

Related to: 10