Work

Chemical reaction and silicide formation at the Pt/Si interface

Year: 1984

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.572574

Authors: R. Matz, R. J. Purtell, Y. Yokota, G. W. Rubloff, P. S. Ho

Institution: IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070860963

FWCI: 3.688

Cites:

Cited by: 43

Related to: 10