Work

Two-dimensional junction profiling by selective chemical etching: Applications to electron device characterization

Year: 1996

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.588485

Authors: C. Spinella, V. Raineri, F. La Via, S. U. Campisano

Institution: Institute for Microelectronics and Microsystems

Language: English

Topic: Advanced Materials Characterization Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2071143356

FWCI: 3.288

Cites:

Cited by: 19

Related to: 10