Work

Elucidating the kinetics and mechanism of RAPID lithography

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.912944

Authors: Michael P. Stocker, John T. Fourkas

Institution: University of Maryland, College Park

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Materials Research Science and Engineering Center, Harvard University

OpenAlex ID: W2071293170

FWCI: 0.687

Cites:

Cited by: 1

Related to: 10