Bond Insertion, Complexation, and Penetration Pathways of Vapor-Deposited Aluminum Atoms with HO- and CH3O-Terminated Organic Monolayers
Year: 2002
Type: article
DOI: 10.1021/ja0123453
Language: English
Subfield: Physical and Theoretical Chemistry
Field: Chemistry
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2072182053
