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Applying reconfigurable RET across process window to create more robust manufacturing designs

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.631877

Authors: Mark Laurance, Abhishek Vikram, Melody Ma, William Volk, Melissa Anderson, Scott Andrews, Bo Su, Hong Du, Gaurav Verma

Institution: KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2072472266

FWCI: 0.55

Cites:

Cited by: 2

Related to: 10