Work

Optical and structural characterization of copper indium disulfide thin films

Year: 2001

Type: article

Source: Materials & Design (1980-2015)

DOI: 10.1016/s0261-3069(01)00019-x

Authors: D.O. Henderson, R. Mu, A. Ueda, M.H. Wu, E.M. Gordon, Y.S. Tung, M. Huang, J. Keay, L.C. Feldman, J.A. Hollingsworth, W.E. Buhro, J.D. Harris, A.F. Hepp, R.P. Raffaelle

Institutions: Fisk University, Vanderbilt University, Washington University in St. Louis, Glenn Research Center

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Aeronautics and Space Administration, Kent State University

OpenAlex ID: W2073080711

FWCI: 2.505

Cites: 8

Cited by: 26

Related to: 10