Work

Resist materials design: base-catalyzed chemical amplification

Year: 1993

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.154770

Authors: C. Grant Willson, James F. Cameron, Scott A. MacDonald, C. P. Niesert, Jean M. J. Frechet, M. K. Leung, Aaron J. Ackman

Institutions: IBM (United States), IBM Research - Almaden, Cornell University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2073776390

FWCI:

Cites: 1

Cited by: 1

Related to: 10