Work

Statistics pattern analysis based virtual metrology for plasma etch processes

Year: 2012

Type: conference-paper

Source: Proceedings of the ... American Control Conference/Proceedings of the American Control Conference

DOI: 10.1109/acc.2012.6315618

Authors: Q. P. He, Jin Wang, H. E. Gilicia, J. D. Stuber, B. S. Gill

Institutions: Tuskegee University, Auburn University, Texas Instruments (United States), Micron (United States)

Language: English

Topic: Fault Detection and Control Systems

Subfield: Control and Systems Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Division of Chemical, Bioengineering, Environmental, and Transport Systems

OpenAlex ID: W2073880442

FWCI:

Cites: 12

Cited by: 8

Related to: 10