High speed resistive switching in Pt∕TiO2∕TiN film for nonvolatile memory application
Year: 2007
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.2818691
Institution: Fujitsu (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2074429207
