Work

Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Year: 1999

Type: article

Source: Applied Optics

DOI: 10.1364/ao.38.007252

Authors: Patrick P. Naulleau, Kenneth A. Goldberg, Sang H. Lee, Chang Chang, David Attwood, Jeffrey Bokor

Institutions: Lawrence Berkeley National Laboratory, University of California, Berkeley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2078243939

FWCI: 8.876

Cites: 14

Cited by: 93

Related to: 10