Cooperative effects between arsenic and boron in silicon during simultaneous diffusions from ion implanted and chemical source predepositions
Year: 1974
Type: article
Source: Solid-State Electronics
Author: Richard B. Fair
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2078254360