Work

Ultrathin poly(methylmethacrylate) resist films for microlithography

Year: 1989

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.584450

Authors: S. W. J. Kuan, C. W. Frank, Y. H. Yen Lee, T. Eimori, D. R. Allee, R. F. W. Pease, R. Browning

Institutions: Stanford University, Stanford SystemX Alliance

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2078851666

FWCI: 0.945

Cites:

Cited by: 33

Related to: 10