Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system
Year: 2009
Type: conference-paper
DOI: 10.1117/12.814254
Authors: Fred de Jong, Bert van der Pasch, Tom Castenmiller, Bert Vleeming, Richard Droste, Frank van de Mast
Institution: ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2079389447