Work

Dielectric antireflection layer optimization: correlation of simulation and experimental data

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.536560

Authors: Yiming Gu, Anthony Wang, Dyiann Chou

Institution: Integrated Device Technology (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bhabha Atomic Research Centre

OpenAlex ID: W2079966953

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