Work

Effect of annealing on dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition

Year: 2002

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.1482788

Authors: Tomohiko Sugiyama, Tomoyoshi Tai, Takashi Sugino

Institution: The University of Osaka

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2081478662

FWCI: 1.43

Cites: 21

Cited by: 33

Related to: 10