Thermal conductivity of heavily doped low-pressure chemical vapor deposited polycrystalline silicon films
Year: 1988
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.339924
Authors: Y. C. Tai, C. H. Mastrangelo, R. S. Muller
Institution: University of California, Berkeley
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2082948558