Work

Inverse lithography technology at low k1: placement and accuracy of assist features

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.693039

Authors: Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2083148631

FWCI: 1.059

Cites:

Cited by: 8

Related to: 10