Generating an Etch Resistant “Resist” Layer from Common Solvents Using Scanning Probe Lithography in a Fluid Cell
Year: 2005
Type: article
Source: Nano Letters
DOI: 10.1021/nl048014g
Authors: Itai Suez, Scott A. Backer, Jean M. J. Fréchet
Institution: University of California, Berkeley
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2083161673