Work

Properties of a ‐ SiO x : H Thin Films Deposited from Hydrogen Silsesquioxane Resins

Year: 1998

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.1838726

Authors: M. J. Loboda, C. M. Grove, R. F. Schneider

Language: English

Topic: Silicone and Siloxane Chemistry

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2083481954

FWCI: 5.879

Cites:

Cited by: 183

Related to: 10