Work

Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles

Year: 1993

Type: article

Source: Journal of Polymer Science Part A Polymer Chemistry

DOI: 10.1002/pola.1993.080310101

Authors: J. T. Fahey, K. Shimizu, J. M. J. Fréchet, N. Clecak, C. G. Willson

Institutions: Cornell University, IBM Research - Almaden

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2087906923

FWCI: 1.483

Cites: 24

Cited by: 10

Related to: 10